"Ru Three Ways With a Side of Pt"
Professor Lisa McElwee-White - Department of Chemistry, University of Florida
Host: Alexandra Velian

Precursor choice for any deposition method requires consideration of the reaction conditions and possible decomposition mechanisms for the particular method. This talk will present mechanism-based precursor design and deposition of Ru and Pt thin films and nanostructures by three different methods: Photo-Assisted Chemical Vapor Deposition (PACVD), Focused Electron Beam-Induced Deposition (FEBID) and Focused Ion Beam-Induced Deposition (FIBID).

Area Selective Deposition (ASD) on thermally sensitive patterned substrates is of interest for the manufacturing of electronic devices with organic components. We are developing techniques for deposition of Ru on organic substrates by PACVD, using terminal functional groups of self-assembled monolayers to define the growth and non-growth areas for ASD. In PACVD, the reaction with the surface is initiated by photolysis, but subsequent reactions on the substrate surface are thermal so an understanding of the precursor photochemistry and reactivity with surface functionality is necessary for precursor design. Examples of mechanistic studies and PACVD results for Ru deposition will be presented.

Techniques for fabrication of Ru-containing nanostructures have been of recent interest due to applications in building interconnect wires in semiconductor devices and, more importantly, the repair of photomasks for extreme ultraviolet lithography. Such nanostructures can be fabricated using FEBID and FIBID from organometallic Ru precursors. We are using mechanistic insights from electron- and ion-induced reactivity on surfaces and in the gas phase to design Ru precursors specifically for FEBID and FIBID. Some of the insights come from related Pt chemistry for FEBID and FIBID. Synthesis of candidate precursor complexes, evaluation of their reactivity with electrons and ions in the gas phase, and deposition of Ru-containing material under UHV surface science conditions and by conventional FEBID/FIBID will be discussed.

The Department of Chemistry is committed to providing access and accommodation. To make a request connected to a disability or health condition for this event, contact us at chem59x@uw.edu.